TECHGuru

  Plasma Impulse Chemical Vapor Deposition (PICVD) coating also known as Plasma Enhanced Chemical Vapor Deposition (PECVD) coating is vacuum controlled thin film deposition process carried out at low temperatures and is carried out in Plasma Impulse Chemical Vapor Deposition (PICVD) reactors. In Plasma Impulse Chemical Vapor Deposition (PICVD) process the carrier gas is reacted in the Plasma Impulse Chemical Vapor Deposition (PICVD) reactors and a plasma is created using electromagnetic waves, which is then deposited on the surface of substrate. It is mainly employed for surface coating process on polymer substrates where traditional CVD (Chemical Vapor Deposition) technology fails. Plasma Impulse Chemical Vapor Deposition (PICVD) coatings on the polymer substrates are anti-reflective, anti-scratch and easy to clean layers. The Plasma Impulse Chemical Vapor Deposition (PICVD) technology is mainly used in pharmaceutical and semi-conductor industry.        Global...